Two options:
-sputter Ti (PVD-DC sputterer) in an O2/N2 ambient at a relatively
slow rate (increase O2 to get higher concentration of O2 in TiO2 of
course, you'll have to play with stoichemitric ratios to get your
desired results)
-order a TiO2 target from Kurt Lesker or similar (check Lesker's
website) and use PVD / an RF sputterer to deposit the film.

Which option you pick depends on how thick you want the film and how
high quality your material is, as well as the sputtering rate and
ambient O2 concentration if you try to create your own.

Also, bear in mind that when a freshly sputtered layer of Ti is
exposed to atmosphere, it will almost instantly form about 80-100A of
TiO2.


>I  want to work on coating of TiO2 thin film by PVD
>method. I want to know that it is possible? or it must
>be do with another way...Please let me know if you
>have any information about this. Thanks!