Hi Thomas,

You would be better served safety-wise by running an NMP-based process.  You
can safely run NMP solvent up to 70 degrees C without too much worry.  And
you should do this in an all-metal station.

- Justin

-----Original Message-----
From: Wilson, Thomas [mailto:[email protected]]
Sent: Wednesday, December 15, 2004 12:17 PM
To: General MEMS discussion
Subject: [mems-talk] Elevated temperature acetone bath for metallic
liftoff process


I've noticed that an ultrasonic acetone bath is too vigourous for my
particular metallic liftoff process with AZ5214E (1.4-micron thick) in
the case of a thin sputtered aluminum film (1000-A thick). Oftentimes,
the 10-micron wide patterned Al features also liftoff from the
substrate. I would like to know if anyone has experience with using
acetone at elevated temperature during liftoff (with the acetone beaker
immersed in a 37 degree C water bath)? Thank you.


Thomas E WILSON, Ph.D.
Professor of Physics and Physical Sciences
Marshall University
One John Marshall Drive
Huntington, WV  25755-2570
Tel: (304) 696-2752
FAX: (304) 696-3243

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