Hi,
I'm having problems with unwanted image reversal in S1813 resist patterns. Large
structures (connection pads etc.) are developing properly (i.e. resist removal
in exposed areas) but in equal line:space gratings the image is reversed (i.e.
resist is removed from areas which should be dark field). It's standard g-line
contact printing, 0.5um resist layer and 1.8um linewidths in the grating
structures. Any suggestions for correcting this would be appreciated.

Thanks,
Brian

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