Al evaporation.
 My target thickness is 1500A.

 1A/s to 150A,   150Seconds.
 10A/s to 1500A, approximately another 150 Seconds.

 The molten Al is about 700C. Will the radiation heat be too much after 5
 minute heat radiation exposure? I think the substrate has to be kept below
 80C.
 Should I increase the rate to control under 30seconds? or the heat from the
Al has more effect?


 -Andrew