I would like to know if someone can recommend a simple etchant/cleaning
process for (100) Si (that will not etch Si - very important as there is
a nipi superlattice on one face) but will remove the following sputtered
(~100-nm thick) metallic films from the Si surfaces: Nb (100-nm), Cr\Au
pads (10-nm\100-nm), and Al (100-nm).



I will find out soon if a piranha clean will do the trick but just in
case ... thanks.



Thomas