Hi,

I need a substance to use as a dry etch mask (in Chlorine-
based plasmas) that is patternable by PMMA.  It would
preferably be spin-coated and removed by solvents.

Photoresist is durable enough for the etch-mask, but I know
of no way to pattern photoresist using PMMA.  If you have any
ideas to try, please let me know.

Let me know your ideas,

Thanks,
William Lanford