Hi,
For various reasons, I need to pattern by electron-beam lithography.
I was thinking about trying PMMA on top of AZ5214, then flood exposing the
AZ5214 and developing with the patterned PMMA mask in place.  I don't know
if the PMMA develop will effect the PR though, or if I can even get a
vertical sidewall on the PR using this process.

Ultimately, I am asking about this because the PMMA itself was not a
suitable etch mask.  It is degraded much too fast in the high-density
dry-etching plasma.

Bill