Dear All,

Generally speaking, SiN mask is patterned by dry etching.But I want to do some
wet etching with SiN mask. At first I sputtered a SiN film on a Si wafer.Then a
standard photolightprocess was processed. Now I don`t know how to etch SiN with
the photoresist.Is the hot phosphoric acid OK?But I`m afraid that the
photoresist can not last for long in the hot phosphoric acid. So what can I do?
Please help me.
Thanks!

LeiNie in HUST of China P.R.
          2005-01-13