Hi Luis,

        Are you referring to XeF2 gas-phase etching or plasma etching?
There is a simple system that you may try to build. Here is a
reference you may be interested to check out:

Chan, I.W.T.; Brown, K.B.; Lawson, R.P.W.; Robinson, A.M.; Yuan Ma;
Strembicke, D., "Gas phase pulse etching of silicon for MEMS with xenon
difluoride," Engineering Solutions for the Next Millennium. 1999 IEEE
Canadian Conference on Electrical and Computer Engineering (Cat.
No.99TH8411), 1999, pt. 3, p 1637-42 vol.3


Yours sincerely,

Isaac Chan
University of Waterloo