Hi folks
I´m looking for a mask material to be used in wet etching of tungsten in a
30% solution of H2O2 or in a solution consisting of H2O2/NH4OH/DIW. I´m
espesially interested in a H2O2 resistant material. Tungsten foil used is 25
microns thick and it is etched through in about 2 hours. Material should be
as easily appliable, patternable and strippable as possible. I tried thin
layers (150nm) of Al and AlN but those didn´t work. They lasted under 30
seconds. Any ideas would be greatly appreciated.
Tomi Meilahti
Oxford Instruments Analytical Oy
E-mail: [email protected]