Dear List Members,

I have used AZ 4620 in the past to do lithography on wafers that had
microfluidic channels. However the manufacturer discontinued the old
AZ 4620 formulation and replaced it with AZ P4620. The process
parameters that I had for the old formulation no longer works. I have
looked at the spec sheet for AZ P4620 to develop new parameters,
however saw that it doesn't work as well as the old formulation. The
main problem is that resist does not develop at the bottom of the
fluidic channels. If anyone has worked on parameters for this new
formulation could you please let me know how the new formulation
works? If not can anyone suggest me a positive resist that can be used
for substrates with channels? Thanks a lot for your time.

Oguz