Dear All,

I have to use Si3N4 film for diffusion mask. I will deposit this flim by non
reactive RF sputtering. I have seen in literature that such sputter depsited
flims are amorphous type. I wanted to know if I can use such flim for oxigen
diffusion mask at about 900 degree Centigarde. It would be really nice if
somebody can suggest some refence for checking the properties requierd for Si3N4
film used as diffusion mask.

Thanks in advance

Amol Kumar Singh