Hi there,

Would anybody know a way to isotropically dry etch at least SiO2 without
etching nitride  (I need a selectivity of at least 10:1).   Wet etching
works well enough in BHF, but ultimately I would like a dry etch in a
barrel etcher.  To make matters worse I would like to try it first in
our RIE system with minimised DC bias (as I don't have a barrel etcher
yet).

Cheers

Olly
Origin Energy Solar