Hi,
  We want to etch holes of a couple hundred nanometers in diameter in an
e-beam evaporated Aluminum film. The substrate is clean Glass and the submicron
hole pattern is defined by PMMA and e beam lithography.
  Are there any wet chemstry or dry chemistry ways to leave a good result.

  p.s. we tried RIE but PMMA is hard to be stripped off with Acetone.

  Thanks a lot
  Best Wishes,

                              Xin Heng