how to prevent the natural oxide formation
onpoly-Sifilm for tr
Pierre Huet
2005-03-21
It depends upon how thick an oxide you can tolerate. A thin ~ 1 nm SiOx
layer will form within ~ 1 minute in air. Very difficult to avoid...
even if transport is done in an inert atmosphere, the exposure to air
prior to transport has to be avoided.
Regards,
Pierre x286