August wrote:
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Does anyone have a method to repeatedly clean a combination silicon nitride
and oxide surface of organics?  Piranna and Nitrated Piranna appear to
damage the nitride and plasma cleaning takes to long to remove the organics.

I need to be able to use this proceedure numerous times without etch or
oxidizing the layers.
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Why would not a plasma etcher, one operating at 100 watts and generally more
power than one finds in a plasma cleaner, and using pure oxygen, remove the
surface organics?

One example (but there are others) would be the SPI Supplies Plasma Prep II
unit, URL
www.2spi.com/catalog/instruments/etchers1.shtml

Disclaimer:  SPI Supplies manufactures this equipment so we have a vested
interest in this posting.

Chuck