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MEMSnet Home: MEMS-Talk: Cleaning Si3N4 / SiO2 Surface
Cleaning Si3N4 / SiO2 Surface
2005-03-28
[email protected]
2005-03-30
li cai
2005-03-29
[email protected]
2005-03-29
[email protected]
2005-03-29
Garber, Charles A.
2005-03-29
David Henriks
Cleaning Si3N4 / SiO2 Surface
David Henriks
2005-03-29
Dear August:

I would think a plasma cleaner would certainly be ableto handle your
requirements.  Typically, a plasma cleaner will operate at verylow power levels
- which type are you using and do you know what power you are running at?  What
are the other parameters?  What is the size of your sample?  When you say that
plasma cleaning takes too long, how do you efine "too long"?

Something like our PC2000 Plasma Cleaner can actually operate in 2 processing
regimes - cleaning mode which is typically run at less than 20 watts or etching
mode.  Etching mode on the PC2000 can be run up to 150watts.  Perhaps a setting
a little higher than normal cleaning mode would be suitable.

I hope this helps.

David Henriks

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