A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: CF4/O2 pre-mixture for PECVD cleaning
CF4/O2 pre-mixture for PECVD cleaning
2005-03-30
Yuzhu Li
CF4/O2 pre-mixture for PECVD cleaning
Yuzhu Li
2005-03-30
I know many people use pre-mixed CF4/O2 gas for PECVD clean (CF4 10%?)
I am curious that how can the gases stay mixed in the bottle? Most likely
they have diffrent densities, and one will float, the other will sink.
I noticed my cleanning program plasma color is less bright (indicating
less CF4 content), and need longer cleaning time. Could it be O2 is
floated upward in the bottle?


reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
MEMStaff Inc.
Harrick Plasma, Inc.
Tanner EDA by Mentor Graphics
University Wafer