Anodle,

Here is a link to the process we use:

http://microfab.watechcenter.org/media/TechReport/Silicon%20Nitride.pdf

Good Luck,
Eric Miller
WTC

-----Original Message-----
From:  Liu X.F.

 I need deposite a layer of low stress Si3N4 on Si(100) substrate by
LPCVD
with SiH4 and NH3 as precursors,but I wonder how to setup the condition
such
as temperature,pressure,and the mass flow of SiH4 and NH3 respectively.