Hi,

      Thank you guys for replying to my previous mail. What iam trying to do was
to make use of the silicon wafers with the grown oxide layer to fabricate deep
v-grooves using KOH. As you all know that one micro thick is not sufficent
enough to make deep grooves. I can go a head and change the mask to silicon
nitride, but before doing that i wanted to know why can't we grow thicker oxide
layers and use it for deeper grooves. I am trying to look for some books or
papers that gives me some solid proof that i have change the my mask. If any of
you guys can mention the books or papers that i am looking for would be really
helpful and i would really appriciate for your help.

Thank you all,

Regards,
Dhanamjaya R Guda