Hi all,

I am having trouble with thickness, under/over exposure, and under/over
development of AZ4110 and AZ4330 photoresists.  Does anyone has some data on:
PR thickness vs rpm's
exposure dose vs PR thickness
development time vs PR thickness
or other info that could help me?

Ramon Figueroa
Graduate Research Assistant
Microelectronics-Photonics Graduate Program
University of Arkansas