Dear Group,

1) I am looking for an organic resist-like material which can form a 200 to
1500 nm thick coating by spinning. It should not dissolve in water or
developer.

2) I also want to protect it from dissolving when I would spin the
photoresist on it.

Shipley's FSC-M or MicroChem MX 6C are two such material but I am not able
to locate the datasheets for it on the internet or the company's web-site.

Kindly suggest.

Pari.