In the past we've used HF with a surfactant to release polyimide from an oxide
layer. You might also try KOH etching to release from an unoxidized silicon
wafer.

-Mike Martin
 U. of Louisville

>>> [email protected] 05/26/05 9:42 AM >>>

Is anybody aware of a release agent for polyimide films?  I would like to
spin the polyimide onto a wafer, pattern it, and then peel it off intact.

I would greatly appreciate any help.