Hi Pari,

Brower Science sell a lift-off polymer called Prolift that might be helpful.
The thickness is around 2um in 5000rpm.  It is not sensitive to photoactive,
but it can be pattened by developer if you spin a positive photoresist
(Sheply 1813, 1827) on top, expose and then disolved in MIF312 or CD27.

Good Luck,
Eric

-----Original Message-----
From: Parijat Bhatnagar [mailto:[email protected]]
Subject: [mems-talk] Non-photoactive resist

Dear Group,

1) I am looking for an organic resist-like material which can form a 200 to 1500
nm thick coating by spinning. It should not dissolve in water or
developer.

2) I also want to protect it from dissolving when I would spin the
photoresist on it.

Shipley's FSC-M or MicroChem MX 6C are two such material but I am not able to
locate the datasheets for it on the internet or the company's web-site.