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MEMSnet Home: MEMS-Talk: Non-photoactive resist
Non-photoactive resist
2005-05-26
Parijat Bhatnagar
2005-05-26
Isaac Wing Tak Chan
2005-05-26
Robert Black
2005-05-27
Eric TANG Xiaosong
2005-05-27
Brubaker Chad
2005-05-27
Brubaker Chad
Non-photoactive resist
Brubaker Chad
2005-05-27
Pari,

Another candidate would be the non photoactive Cyclotene materials (3000
series) - the information sheets are actually located on Dow's website
(do a product search for "Cyclotene").

Best Regards,
Chad Brubaker


 -----Original Message-----
From: Parijat Bhatnagar
Subject: [mems-talk] Non-photoactive resist

Dear Group,

1) I am looking for an organic resist-like material which can form a 200
to
1500 nm thick coating by spinning. It should not dissolve in water or
developer.

2) I also want to protect it from dissolving when I would spin the
photoresist on it.

Shipley's FSC-M or MicroChem MX 6C are two such material but I am not
able
to locate the datasheets for it on the internet or the company's
web-site.
reply
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