Dear members,

I am just wondering if any metal can act as the masking layer( strong
enough in KOH and easy to be removed) for deep KOH etching (say,~600 um
deep) at 80 degrees. (It may take about 10 hours to finish the etching
process). I tried NiCr (50 nm) but it could not sustain after 2 hours.


Daxiang Zhou