Hi Harshal,

Sputtered silicon nitride (and low temperature PECVD Nitride as well) do not
hold up well to HF.  You may want to consider LPCVD nitride which is much
more HF resistant. For example etch rates for our low stress lpcvd nitride
in 10:1 HF are around 6A per minute.

Best Regards,

Jessica
-----Original Message-----
From: harshal rokade [mailto:[email protected]]
Subject: [mems-talk] Sputtered silicon nitride film ech rate

I am trying to get silicon nitride film from sputtering which wont get ethed
in HF. My surrent films are getting etched in HF in 30 secs. in wich
parameters does etch rates depends??
and what are those?