Would anyone be interested in a collaboration to assist with the
fabrication via an ultrahigh vacuum (<10-8 Torr) electron beam

evaporation system, of a superlattice consisting of 28 alternating
layers of a:Si02 and a:Si, of thickness 5.0-nm and 8.6-nm respectively,
with ~3% individual thickness control, over a surface area of 2 square
millimeters on a [100] silicon platelet. All comments appreciated.

Thomas E Wilson
Professor of Physics
Marshall University