A good source is:

"Controlled Pulse Etching With Xenon Diflouride", P. Chu, J Chen, Transducers
1997,

We have a system built on this design and added in additional pump purge
cycles, before etching, after each fourth etch cycle, and before venting.  We
also used an activated charcoal filter on the roughing line before the pump
to increase pump life and reduce emissions.

--
Shane McColman
Research Professional
NanoFab, University of Alberta


On June 15, 2005 08:06 am, Dr Michael Cooke wrote:
> I am looking to develop an XeF2 Si etching system. If anyone has any
> useful tips that they could let me have it would be greatly appreciated.
> Particularly with relevance to making the system 100% safe and minimising
> any etching effects of parts of the system
>