Greetings,

I am looking for a resist coating material against EDP (ethylenediamene
pyrocatecol), an etching solution against silicon. I am looking for
something analogous to baked photoresist against HF. Since my samples are
of SOI (a SiO2 layer between two Si layers) and I want to etch a pattern
on the top Si layer only, I cannot use SiO2 as the "mask." I can use
nitride as the mask, but it involves too many steps. I want a resist
material like photoresist that I can use as a photolithography mask.


Best,
Han Yoo