Hello
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I want to etch 150nm thick Chromium films (vapor deposition with 2 nm/sec).
After deposition the films are smooth on a scale of 20 nm. During etching with
NaOH : K3Fe(CN)6 : H20 = 1:2:8 the roughness increases dramatically on a
scale of about 200 nm. How could I reduce this effect?

Yours sincerely
   Jochen