Hello,

I would like to functionalize a SiO2/Si or glass surface to improve
film deposition of metal oxides on the substrate. I think SAMs based on
organosilicon molecules, is the best way to go. The problem is that my
film deposition occurs in H2O, at pH=10 and temperature of 75 deg C,
and I'm afraid the basic conditions will attack the monolayer.

Does anyone have experience with organosilane monlayers, and had
problems with stability in aqueous solution?

Where can I find studies on the stability of these monolayers in
different environments?

Thanks,
Simon Garcia