But in our system, a Plasma-Lab ICP-RIE, we are using the
Silicon Nitride as a mask for Cl2/Ar etching....and it
doesn't etch much at all.  Does you know if CH4 will work?

This is with a PMMA etch mask.  We suspect fluorine interacts
with the underlying materials (not just as etch damage...) so
I did want to compare results using a non-fluoring containing
etch.
Thank you for your suggestion.

>
>Hi Bill,  Cl2 + Ar will work... But depending on why you are
>trying to avoid F, Cl may be worse...  -Marie