How much is the tolerance of the angle? If the angle requirement is not
strict, the simplest way is KOH etch. The etch rate can be 1-2um per minute.

Good luck,

Hongjun Zeng, PhD
MEMS/Nano Scientist
Microfabrication Application Laboratory
University of Illinois at Chicago

-----Original Message-----
From: ning
Subject: [mems-talk] How to etch Silicon into oblique walls using ICP?

Hi everyone,

Common goals of using ICP etching is to form vertical walls. But what I need
to do is just the opposite. We want to etch in Silicon wafer some deep
trenches with an oblique angle about 45 degree. And we want the etch rate to
be as fast as possible.
I am completely new to this topic, I really need some advice.
Thanks.
Ning