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MEMSnet Home: MEMS-Talk: Photoresist for Lift-off process
Photoresist for Lift-off process
2005-08-02
Richard Chang
2005-08-03
Bill Moffat
2005-08-05
Brubaker Chad
2005-08-08
Huy Vo
KOH Wet Etching of Si wafers
2005-08-09
Daniel Park
2005-08-10
Shay Kaplan
2005-08-12
Christian Schröder
2005-08-12
Josef Kouba
2005-08-09
Wilson, Thomas
2005-08-11
Boyd Evans
Photoresist for Lift-off process
Bill Moffat
2005-08-03
Richard,
        Think any positive resist a YES image reversal unit and the
ability to manufacture below 0.1 micron.


Bill Moffat, CEO
Yield Engineering Systems, Inc.
2185 Oakland Rd., San Jose, CA  95131
(408) 954-8353

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