Prem,

  The optimum thickness is as small a possible. But
0.2um is good enough. I obtained the same using a
Silane flow rate of 200sccm,595 deg C and a deposition
time of about 50min.

  Regarding doping i used Boron Diffusion and just
saturated the poly without doing the drive-in
diffusion.

Regards
Rakesh


--- Prem  Pal  wrote:

> Dear Researchers
>
> I wish to use LPCVD polysilicon for piezoresistors
> on silicon nitride or silicon dioxide cantilever
> beams. I wish to know the optimum thickness and
> doping concetration for high piezoresistivity. For
> my work, I want to use polysilicon thickness as
> minimum as possible which can effectively work for
> high piezoresistivity.
> Any kind of suggestion regarding this matter would
> be highly appreciated.