Comparision of resistance to dry etching between SU8
and common photoresist
X.P. Zhu
2005-08-12
Dear members,
I want to use photoresist as mask to pattern III-V
semiconductor wafer by ICP or RIE. Which is better:
SU8 ,AZ4620, Shipley S-series etc? Thanks a lot.
ZHU X.P.
