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MEMSnet Home: MEMS-Talk: Problems with lift-off using S1813 photoresist
Problems with lift-off using S1813 photoresist
2005-08-23
ahajjiah
2005-08-23
William Lanford-Crick
2005-08-23
Steven McMaster
2005-08-23
William Lanford-Crick
2005-08-23
Bill Moffat
2005-08-23
Wilson, Thomas
2005-08-23
schahrazede mouaziz
2005-08-24
ANIRBAN CHAKRABORTY
Problems with lift-off using S1813 photoresist
William Lanford-Crick
2005-08-23
In my experience, MIF 319 etched aluminum very fast.  I used to use MIF 319
to remove LOR-5B after lifting off Al with Acetone (using bilayer).  It
etched the Al very rapidly.

-Bill

-----Original Message-----
From: [email protected] [mailto:[email protected]]
On Behalf Of Steven McMaster
Sent: Tuesday, August 23, 2005 9:23 AM
To: 'General MEMS discussion'
Subject: RE: [mems-talk] Problems with lift-off using S1813 photoresist

You can use MIF 319 to develop out the S1813 and LORXXB. So I recommend
still using the bi layer method.

Steven McMaster
Engineer


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