We've done the UV exposure and bake to cross link photoresist.  This can
result in wrinkles in the resist for some resists, but Shipley has some data
sheets on how to do it and avoid wrinkles.
Also, you can use an EPROM eraser as a fairly inexpensive UV source, as it
take a fairly long exposure.

David Nemeth
Senior Engineer
Sophia Wireless, Inc.
14225-C Sullyfield Circle
Chantilly, VA 20151

-----Original Message-----
From: Phillipe Tabada
Subject: RE: [mems-talk] MEMS switch contact dimple

Hi Erkin

  Look up processes involving UV hardening your PR and then placing it under
elevated temperatures in order to crosslink the polymers.  This should
prevent the first layer of PR from dissolving when the second layer of PR is
deposited.

Phil Tabada