Dear all,

I need to deposit a resistive material with a conductivity of 2000-5000
S/m. I searched the literature and found that this can be done  with
SiCr sputtering, but I could not find the ratio of the Si and Cr for the
sputtering target. Does anyone have any idea about selecting a
sputtering source or any other material with 2000-5000 S/m which can be
deposited with standard DC or RF sputtering tools?

Any help will be appreciated.

Thanks in advance,

Mehmet Unlu