Hi all together,

I have got a question concerning etching of parylene. As far as I know, the way
to etch parylene is an oxygen plasma etching process. As the ratio to a resist
is about 1:1, I want to use a chromium mask to pattern the parylene during the
etching.
My question is: has anybody any expertise in this etching process and can give
me some data that I can use as a guideline?

Thanks in advance.
Johannes