Using a high density plasma you can get incredibly fast etch rates, i.e.
>2um/min - parylene-N, check this paper out, there's some fundamental
insights that will help you along your way...... BTW remember that there are
different types of parylene, and depending on which one you are etching, you
might want to optimize your feedgas chemistry. eric

JVST - Journal of Vacuum Science and Technology
 "High-density plasma patterning of low dielectric constant polymers: A
comparison between polytetrafluoroethylene, parylene-N, and poly-arylene
ether)," T.E.F.M. Standaert, P.J. Matsuo, X. Li, G.S. Oehrlein, T.-M. Lu, R.
Gutmann, C.T. Rosenmayer, J.W. Bartz, J.G. Langan, and W.R. Entley, J. Vac.
Sci. Technol. A 19, 435-446 (2001).

> -----Original Message-----
> From: Johannes Grether
> Sent: Tuesday, September 06, 2005 8:50 AM
> To: [email protected]
> Subject: [mems-talk] plasma etching of parylene
>
> Hi all together,
>
> I have got a question concerning etching of parylene. As far as I know,
the
> way
> to etch parylene is an oxygen plasma etching process. As the ratio to a
> resist
> is about 1:1, I want to use a chromium mask to pattern the parylene during
> the
> etching.
> My question is: has anybody any expertise in this etching process and can
> give
> me some data that I can use as a guideline?
>