Hi,

In my experience, the broadening of the lines can be due to reflection
whithin the pyrex and from the chuck (I observed myself that kind of
reflections using SU8-2100. But in my case, it was extremely clear that the
reason were reflections from the chuck because I could even see the shape of
the chuck in the developped sample!!).

Another possibility is that you dont have very good contact between the mask
and the SU8 layer. Therefore, the diffraction can expose the sides of your
pattern (specially since you are using such large doses!).....

Good luck!

Sonia.


-----Message d'origine-----
De : shay kaplan [mailto:[email protected]]
Envoyé : Friday, September 30, 2005 7:02 AM
À : 'General MEMS discussion'; [email protected]
Objet : RE: [mems-talk] SU-8 over-exposure


Looking at the profile it looks like reflections. You see the cancellation
at the bottom etc. if this was diffusion, the line widening would have been
more uniform.

Shay