I don't think it's reasonable to do ion implantation. You can do
simulation with SRIM2003 to see the energy and doser level. Even for
thermal diffusion, you have to wait a long time. For diffusion, you can
try  Borofilm.


On 12/19/2005 1:12 PM, Vinay wrote:

>Hello All,
>We are trying to perform boron diffusion on silicon and hoping to achieve
>depths in the range of 20 to 25um. I spoke to a couple of companies who do
>ion implantation and they suggested i go with thermal diffusion of boron as
>against ion implantation. What do you guys think? Any suggestions or
>comments would be greatly appreatiated.