Hi Lung-hao Hu,

If I've understood yout question correctly SU-8 will most probably be unsuitabe
for your metal lift off as it is not easily removed unless a release layer is
used. Even if this is the case there are easier/beter ways of doing it - I do
not imagine this would give you great resolution.

You mentioned Microchem which sell resists specifically for liftoff in the form
of lift-off resists and image reversal resists - these are much more suited to
the applicaiton than SU-8.

Would you be able to use a chlorobenzyne process with 'standard' positive
resist? This is often a cheap alternative which can yield good results. If you
would like any more information on this please feel free to mail me directly:
depending on the positive resists you have available I may be able to give you
some processing parameters to get you started.

Regards,

Novak

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I wanna try to use SU-8 to lift-off metal layer.
Is there anyone trying this process before??
Should I just pre-bake 65 and 95 C and then deposit the metal layer??
Or I need to expose to UV and then post-bake?
Can I use Remover PR with Ultrasound and at 60 C for the lift-off??
Is there any Microchem stuff who can answer my question??