Since they have only been softbaked, you can try flood exposing them (using
a clear reticle and long expose time) then develop them.

-----Original Message-----
From: [email protected] [mailto:[email protected]]
On Behalf Of Sven Holmström
Sent: Thursday, December 22, 2005 5:13 PM
To: General MEMS discussion
Subject: Re: [mems-talk] Removing dry resist

Thanks for the answers. Most of you say Oxygen plasma, which we have
been thinking of too. But as of now we don't have that available
locally (we could send it away though, for certain cost).

On 12/22/05, Shile  wrote:
> Try a photoresist stripper.  I'm not aware of acetone as an ingredient
> in any commercially made resist stripper.

Does anytone else have an opinion about this. Might it be possuble to
use a stripper when the resist is totally dried out? (BTW, we know
that acetone works when the S1813 is not too aged.)

/Sven