Chad
     Yes I agree. But it is not an ordinary photolithography process that I am
looking at. I am trying to obtain sub-diffraction-limited image with silver
coated with photoresist.
    What imprint resist you used for 8nm feature size?
  thanks
  -pratik

Brubaker Chad  wrote:
  It isn't really possible to produce 20-25 nm features solely using NUV
exposure. The only way I know of to produce features that size using
wavelengths in that range is to perform a nano-imprint process (such as
that performed using a specially tooled EVG620 - we've actually achieved
features as low as 8 nm).

Best Regards,
Chad Brubaker

-----Original Message-----
From: [email protected]
[mailto:[email protected]] On Behalf Of Pratik Chaturvedi
Sent: Saturday, January 07, 2006 4:38 PM
To: [email protected]
Subject: [mems-talk] High resolution photoresist

Hello,
I'm looking for a photoresist (380 nm working wavelength) capable of
resolving 20-25 nm features. Does anyone have worked or know of some
material that could be used for the purpose?
thanks
-pratik