A good resource would also be www.NILCOM.org.  Some of the members there
(Toyo Gosei is one, but there is also Micro Resist Technology, and AMO
has published results with their proprietary material).

Best Regards,
Chad Brubaker



-----Original Message-----
From: Noemi Graziana
Sent: Tuesday, January 10, 2006 3:22 AM
To: 'noemi sparta'; 'General MEMS discussion'; Brubaker Chad
Subject: RE: [mems-talk] High resolution photoresist

We did a demo on EVG620 equipment to evaluate NIL.We reached 15nm L&S
using
a negative photoresist  from Toyo Gosei.

Regards
Noemi