Hello everybody,

I've done some measurements of Gate CD after Photo & after Etch to get an idea
about the intra-field variation of CD. this intra-field variation (Std
Deviation) was surprisingly more important after photo than after etch. So I
wonder if the CDSEM measurements are precise enough, knowing that the technology
I am working on is of 0.13 µm.

  Do u have any idea about the repeatability (how accurate) of CD measurement
after photo ?

  I thank you in advance. Nader