Az5214, Shipley 1818, Az4620..., are good for liftoff, depending on you
feature size and profile height. We have done with them for many times
without any problem. Let me know if you have any questions.
Good luck,
--------------------------------------
Hongjun Zeng, PhD
MEMS/Nano Scientist
Nanotechnology Core Facility
(NCF formerly MAL)
University of Illinois at Chicago
3064 ERF Building
842 W. Taylor St., Chicago, IL 60607
Tel. 312-355-1259, Fax: 312-413-0447
------------------------------------
-----Original Message-----
From: [email protected] [mailto:[email protected]]
On Behalf Of Gabe Dagani
Sent: Tuesday, January 24, 2006 11:41 AM
To: [email protected]
Subject: [mems-talk] Gold patterning using lift off on substrates
I was interested if anyone had a particular resist they used for a lift off
process of Cr/Au pads on glass slides or on PDMS.
Process that I would like to perform:
1) Clean substrate
2) Dry, perhaps HMDS
3) Spin PR (What PR is good?)
4) Develop
5) Evaporate Cr/Au on substrate
6) Lift off the PR to expose just substrate and Cr/Au
Has anyone tried this or have suggestions?
I don't know what PR is good for glass slides or PDMS
